Daniel J. Ark, Partner

Biography

Daniel Ark is a member of the firm's Intellectual Property Group and specializes in patent prosecution and counseling. His background in materials science and engineering provides him with a broad technical base that is of particular value to clients having needs in the overlapping areas of materials, mechanical, electrical, or chemical arts.

Dan advises clients at various stages of technological development: from an initial assessment of patentability and right to practice to pre-litigation patent disputes as illustrated below.

  • Counsels clients in the development of their intellectual property rights.
  • Prepares patentability, freedom to operate, and validity opinions.
  • Drafts patent applications and prosecutes them before the United States Patent and Trademark Office to obtain enforceable patent rights.
  • Works with an established network of foreign law firms to prosecute patent applications outside of the United States.
  • Helps clients to grow and manage their patent portfolios.

By understanding your business goals and needs, Dan can assist you in making informed intellectual property decisions and in establishing and maintaining a competitive position in your marketplace.

Technical Experience
Dan has experience in a wide range of technologies and in numerous industries including the following:

  • Aerospace.
  • Clean energy technology.
  • Earth moving equipment.
  • Food preparation equipment.
  • Hydraulic systems.
  • Materials processing and manufacturing.
  • Medical devices.
  • Mobile devices.
  • Nanotechnology.
  • Paper and pulp.

Prior to joining Quarles & Brady, Dan worked in the powder metal industry and assisted in academic research that involved characterizing ceramic nanocomposites.

Legal Services

Education and Honors

  • University of Wisconsin Law School (J.D., cum laude, 2007)
  • University of Wisconsin (B.S., with distinction, 2003)
    • Majors: Materials Science and Engineering
    • Tau Beta Pi

Bar Admissions

  • Wisconsin

Court Admissions

  • U.S. Patent and Trademark Office, 2007